Ngai, Chris K.H.: search on Z-Library

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1

The Making of a New Working Class? A Study of Collective Actions of Migrant Workers in South China

Chan, Chris King-Chi, Ngai, Pun

Journal:

The China Quarterly

Year:

2009

Language:

english

File:

PDF, 291 KB

english, 2009

2

Class and Precarity: An Unhappy Coupling in China’s Working Class Formation

Smith, Chris, Pun, Ngai

Journal:

Work Employment & Society

Year:

2018

Language:

english

File:

PDF, 206 KB

english, 2018

3

Predicting social capital on Facebook: The implications of use intensity, perceived content desirability, and Facebook-enabled communication practices

Su, Chris Chao, Chan, Ngai Keung

Journal:

Computers in Human Behavior

Year:

2017

Language:

english

File:

PDF, 501 KB

english, 2017

4

Structured Relapse Prevention Program for Chinese Patients in Hong Kong with Comorbidity of Substance Use and Mental Health Disorders: A Feasibility Study

Ngai, Chris K.H., Wu, Cynthia S.T., Suen, Lorna K.P.

Journal:

Journal of Psychoactive Drugs

Year:

2020

File:

PDF, 1.03 MB

2020

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - EUV defect characterization study on post litho and etch for 1x and 2x node processes

Raymond, Christopher J., Montal, Ofir, Cai, Man-Ping, Dotan, Kfir, Dolev, Ido, Wallow, Tom, Wood, Obert, Okoroanyanwu, Uzo, Rozentsvige, Moshe, Ngai, Chris, Bencher, Chris, Conley, Amiad

Year:

2011

Language:

english

File:

PDF, 1.79 MB

english, 2011

6

The dormitory labour regime in China as a site for control and resistance1

Smith, Chris, Pun, Ngai

Journal:

International Journal of Human Resource Management

Year:

2006

Language:

english

File:

PDF, 132 KB

english, 2006

7

[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Defect gallery and bump defect reduction in the self Aligned Double Patterning module

Cai, Cathy, Padhi, Deenesh, Seamons, Martin, Bencher, Chris, Ngai, Chris, Kim, BH

Year:

2010

Language:

english

File:

PDF, 1.04 MB

english, 2010

8

Disruptive Information Technology Innovations and the Cost of Equity Capital: The Moderating Effect of CEO Incentives and Institutional Pressures

Lui, Ariel K.H., Ngai, Eric W.T., Lo, Chris K.Y.

Journal:

Information & Management

Year:

2015

Language:

english

File:

PDF, 287 KB

english, 2015

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Characterization of EUV resists for defectivity at 32nm

Raymond, Christopher J., Montal, Ofir, Dolev, Ido, Rosenzweig, Moshe, Dotan, Kfir, Meshulach, Doron, Adan, Ofer, Levi, Shimon, Cai, Man-Ping, Bencher, Chris, Ngai, Chris S., Jehoul, Christiane, Van De

Year:

2011

Language:

english

File:

PDF, 2.12 MB

english, 2011

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Towards manufacturing a 10nm node device with complementary EUV lithography

Hermans, Jan V., Dai, Huixiong, Niroomand, Ardavan, Laidler, David, Mao, Ming, Chen, Yongmei, Leray, Philippe, Ngai, Chris, Cheng, Shaunee, Naulleau, Patrick P.

Year:

2013

Language:

english

File:

PDF, 1.36 MB

english, 2013

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Sidewall spacer quadruple patterning for 15nm half-pitch

Xu, Ping, Chen, Yongmei, Chen, Yijian, Miao, Liyan, Sun, Shiyu, Kim, Sung-Woo, Berger, Ami, Mao, Daxin, Bencher, Christ, Hung, Raymond, Ngai, Chris

Year:

2011

Language:

english

File:

PDF, 10.71 MB

english, 2011

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Innovative self-aligned triple patterning for 1x half pitch using single "spacer deposition-spacer etch" step

Mebarki, Bencherki, Chen, Hao D., Chen, Yongmei, Wang, Aunchan, Liang, Jingmei, Sapre, Kedar, Mandrekar, Tushar, Chen, Xiaolin, Xu, Ping, Blanko, Pokhui, Ngai, Christopher, Bencher, Chris, Naik, Mehul

Year:

2011

Language:

english

File:

PDF, 603 KB

english, 2011

13

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Small particle defect characterization on critical layers of 22nm Spacer Self-Aligned Double Patterning (SADP)

Singh, Gurminder, Dotan, Kfir, Shabtay, Saar, Cai, Man-Ping, Shachar, Noam, Ngai, Chris, Bencher, Chris, Miao, Liyan, Chen, Yongmei, Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 462 KB

english, 2012

14

Does mandated RFID affect firm risk? The moderating role of top management team heterogeneity

Lui, Ariel K.H., Lo, Chris K.Y., Ngai, Eric W.T.

Journal:

International Journal of Production Economics

Year:

2019

Language:

english

File:

PDF, 679 KB

english, 2019

15

A framework for applying real options analysis to information technology investments

Chan, Chris Wang Ngai, Cheng, Chun Hung, Gunasekaran, Angappa, Wong, Kam Fai

Journal:

International Journal of Industrial and Systems Engineering

Year:

2012

Language:

english

File:

PDF, 960 KB

english, 2012

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Process and proximity correction, and verification for extreme ultraviolet lithography

Perçin, Gökhan, Naulleau, Patrick P., Dai, Huixiong, Huang, Hsu-Ting, Liu, Anwei, Mokhberi, Ali, Zheng, Xin, Ngai, Chris

Year:

2013

Language:

english

File:

PDF, 1.51 MB

english, 2013

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Model calibration and slit position effect on full-mask process and proximity correction for extreme ultraviolet lithography

Huang, Hsu-Ting, Naulleau, Patrick P., Wood II, Obert R., Dai, Huixiong, Mokhberi, Ali, Xu, Xumou, Liu, Anwei, Ngai, Chris

Year:

2012

Language:

english

File:

PDF, 3.06 MB

english, 2012

18

SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - Challenges of 29nm half-pitch NAND Flash STI patterning with 193nm dry lithography and self-aligned double patterning

Chiu, M. C., Lin, Benjamin Szu-Min, Tsai, M. F., Chang, Y. S., Yeh, M. H., Ying, T. H., Ngai, Chris, Jin, Jaklyn, Yuen, Stephen, Huang, Sem, Chen, Yongmei, Miao, Liyan, Tai, Kevin, Conley, Amiad, Liu,

Year:

2008

Language:

english

File:

PDF, 1.21 MB

english, 2008

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Post-litho line edge/width roughness smoothing by ion implantations

Ma, Tristan Y., Xie, Peng, Godet, Ludovic, Martin, Patrick M., Campbell, Chris S., Xue, Jun, Miao, Liyan, Chen, Yongmei, Dai, Huixiong, Bencher, Christopher, Ngai, Chris S., Somervell, Mark H.

Year:

2013

Language:

english

File:

PDF, 817 KB

english, 2013

20

The Sp1-Related Transcription Factors sp5 and sp5-like Act Downstream of Wnt/β-Catenin Signaling in Mesoderm and Neuroectoderm Patterning

Gilbert Weidinger, Chris J. Thorpe, Katrin Wuennenberg-Stapleton, John Ngai, Randall T. Moon

Journal:

Current Biology

Year:

2005

Language:

english

File:

PDF, 641 KB

english, 2005

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Design for Manufacturability through Design-Process Integration VII - Understanding device impact of line edge/width roughness in frequency domain

Xie, Peng, Ren, He, Nainani, Aneesh, Dai, Huixiong, Bencher, Chris, Ngai, Chris, Mason, Mark E., Sturtevant, John L.

Year:

2013

Language:

english

File:

PDF, 2.89 MB

english, 2013

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Design for Manufacturability through Design-Process Integration III - Implementing self-aligned double patterning on non-gridded design layouts

Dai, Huixiong, Singh, Vivek K., Rieger, Michael L., Sweis, Jason, Bencher, Chris, Chen, Yongmei, Shu, Jen, Xu, Xumou, Ngai, Chris, Huckabay, Judy, Weling, Milind

Year:

2009

Language:

english

File:

PDF, 5.03 MB

english, 2009

23

[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - VOC induced particle generation during wafer transportation and its solution

Okazaki, Motoya, Niehoff, Sharon, Alkurjy, Ninos, Cai, Cathy, Ngai, Chris, Richtsteiger, Petra, Bounouar, Julien

Year:

2010

Language:

english

File:

PDF, 380 KB

english, 2010

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Sub-20 nm trench patterning with a hybrid chemical shrink and SAFIER process

Chen, Yijian, Henderson, Clifford L., Xu, Xumou, Chen, Hao, Miao, Liyan, Blanco, Pokhui, Cai, Man-Ping, Ngai, Chris S.

Year:

2009

Language:

english

File:

PDF, 6.02 MB

english, 2009

25

Changes in Endosymbiont Complexity Drive Host-Level Compensatory Adaptations in Cicadas

Campbell, Matthew A., Łukasik, Piotr, Meyer, Mariah C., Buckner, Mark, Simon, Chris, Veloso, Claudio, Michalik, Anna, McCutcheon, John P., McFall-Ngai, Margaret J.

Journal:

Year:

2018

Language:

english

File:

PDF, 2.77 MB

english, 2018

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Accounting for mask topography effects in source-mask optimization for advanced nodes

Coskun, Tamer H., Dai, Huixiong, Huang, Hsu-Ting, Kamat, Vishnu, Ngai, Chris

Year:

2011

Language:

english

File:

PDF, 2.65 MB

english, 2011

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Recessive self-aligned double patterning with gap-fill technology

Chen, Yijian, Xu, Xumou, Chen, Yongmei, Miao, Liyan, Chen, Hao, Blanco, Pokhui, Ngai, Chris S., Dusa, Mircea V.

Year:

2011

Language:

english

File:

PDF, 1.40 MB

english, 2011

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - 45nm and 32nm half-pitch patterning with 193nm dry lithography and double patterning

Dai, Huixiong, Bencher, Chris, Chen, Yongmei, Woo, Hyungje, Ngai, Chris, Xu, Xumou

Year:

2008

Language:

english

File:

PDF, 810 KB

english, 2008

29

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22nm node and beyond

Miao, Xiangqun, Huli, Lior, Chen, Hao, Xu, Xumou, Woo, Hyungje, Bencher, Chris, Shu, Jen, Ngai, Chris, Borst, Christopher, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 610 KB

english, 2008

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Tracking defectivity of EUV and SADP processing using bright-field inspection

Cain, Jason P., Sanchez, Martha I., Alexis, Nadine, Bencher, Chris, Chen, Yongmei, Dai, Huixiong, Dotan, Kfir, Huang, Dale, Nalven, Alison, Ngai, Chris, Santoro, Gaetano, Vijayaraghavan, Bharath, Xie,

Year:

2014

Language:

english

File:

PDF, 963 KB

english, 2014

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Alignment and overlay improvements for 3x nm and beyond process with CVD sidewall spacer double patterning

Dai, Huixiong, Levinson, Harry J., Dusa, Mircea V., Bencher, Chris, Chen, Yongmei, Sun, Shiyu, Xu, Xumou, Ngai, Chris

Year:

2009

Language:

english

File:

PDF, 625 KB

english, 2009

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Metrology characterization for self-aligned double patterning

Berger, Ami, Allgair, John A., Raymond, Christopher J., Latinsky, Sergey, Bar-Zvi, Maayan, Peltinov, Ram, Shu, Jen, Ngai, Chris, Yu, James, Dai, Huixiong

Year:

2008

Language:

english

File:

PDF, 278 KB

english, 2008

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Self-aligned triple patterning for continuous IC scaling to half-pitch 15nm

Chen, Yijian, Xu, Ping, Miao, Liyan, Chen, Yongmei, Xu, Xumou, Mao, Daxin, Blanco, Pokhui, Bencher, Chris, Hung, Raymond, Ngai, Chris S.

Year:

2011

Language:

english

File:

PDF, 4.19 MB

english, 2011

34

Suspended single-crystalline oxide structures on silicon through wet-etch techniques: Effects of oxygen vacancies and dislocations on etch rates

Lim, Zheng Hui, Chrysler, Matthew, Kumar, Abinash, Mauthe, Jacob P., Kumah, Divine P., Richardson, Chris, LeBeau, James M., Ngai, Joseph H.

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

2020

File:

PDF, 1.67 MB

2020

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Impact of process decisions and alignment strategy on overlay for the 14nm node

Laidler, David, Conley, Will, D’havé, Koen, Leray, Philippe, Hermans, Jan, Boemmels, Juergen, Cheng, Shaunee, Dai, Huixiong, Chen, Yongmei, Mebarki, Bencherki, Ngai, Chris

Year:

2013

Language:

english

File:

PDF, 3.39 MB

english, 2013

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Spatial frequency multiplication techniques towards half-pitch 10nm patterning

Chen, Yijian, Chen, Yongmei, Miao, Liyan, Xu, Ping, Xu, Xumou, Chen, Hao, Blanco, Pokhui, Hung, Raymond, Ngai, Chris S.

Year:

2011

Language:

english

File:

PDF, 1.52 MB

english, 2011

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Free form source and mask optimization for negative tone resist development for 22nm node contact holes

Coskun, Tamer H., Dai, Huixiong, Kamat, Vishnu, Hsu, Ching-Mei, Santoro, Gaetano, Ngai, Chris, Reybrouck, Mario, Grozev, Grozdan, Huang, Hsu-Ting, Conley, Will

Year:

2012

Language:

english

File:

PDF, 4.61 MB

english, 2012

38

SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing II - Plasma damage monitoring for PECVD deposition: a contact potential difference study and device yield analysis

Xu, Zhiwei, Bencher, Christopher, Le, Maggie, Ngai, Chris, Ajuria, Sergio A., Hossain, Tim Z.

Year:

1998

Language:

english

File:

PDF, 856 KB

english, 1998

39

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - RET application in 45-nm node and 32-nm node contact hole dry ArF lithography process development

Miao, Xiangqun, Flagello, Donis G., Xu, Xumou, Chen, Yongmei, Ordonio, Chris, Bencher, Chris, Ngai, Chris

Year:

2007

Language:

english

File:

PDF, 553 KB

english, 2007

40

Contact resistance improvement by dielectric breakdown in semiconductor-dielectric-metal contact

Majumdar, Kausik, Hobbs, Chris, Matthews, Ken, Chen, Chien-Hao, Ngai, Tat, Yong Kang, Chang, Bersuker, Gennadi, Vivekanand, Saikumar, Rodgers, Martin, Gausepohl, Steven, Kirsch, Paul D., Jammy, Raj

Journal:

Applied Physics Letters

Year:

2013

Language:

english

File:

PDF, 1.28 MB

english, 2013

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Optical Microlithography XXIV - Full-chip OPC and verification with a fast mask 3D model

Huang, Hsu-Ting, Mokhberi, Ali, Dai, Huixiong, Ngai, Chris, Dusa, Mircea V.

Year:

2011

Language:

english

File:

PDF, 1.18 MB

english, 2011

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